P03100 - SEMI P31 - Practice for Catalog Publication for Chemical Amplified (CA) Photoresist Parameter StdTpc-Chemical & Gas Testing This Test Method is intended

This Test Method is intended for use on silicon substrates and epitaxial layers

RDL formation

SEMI E99-0200 (first published)

本安全ガイドラインは，global Environmental Health & Safety Committeeで技術的に承認されている。現版は2011年2月3日，global

orgで入手可能となる。前版は2012年4月発行。

P03100 - SEMI P31 - Practice for Catalog Publication for Chemical Amplified (CA) Photoresist Parameter StdTpc-Chemical & Gas Testing This Test Method is intendedThis Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on May 13, 2011. Available at www. semiviews. org and www. semi. org in June 2011; originally published September 1997; previously published March 2004. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not