Pay in 4 interest-free payments of $48.25 Learn more
Ships within 48 hours · Estimated delivery Aug 7 - Aug 12
or outgassing
This Standard provides guidance on maintenance
SEMI E111-1104 (technical revision)
through the oxide layers
1 This Guide may be used:
MF161800 - SEMI MF1618 - Practice for Determination of Uniformity of Thin Films on Silicon Wafers Revision:SEMI MF1618-1104 - Superseded or outgassingNOTICE: This Document was reapproved with minor editorial changes. The purpose of this Practice is to promote commonality of approach to the analysis of uniformity among all parties needing to generate or assess such information, including manufacturers of the basic test instrumentation to be used. This Practice is intended for process control, research and development, and process equipment evaluation purposes. It is intended for the benefit of
